Deposition of SiOx (Pyrosil ®) on Glass Surfaces - An Alternative Low Cost Process for Various Applications

Hans-Jürgen Tiller, Arnd Schimanski, Bernd Grünler, Karin Glock-Jäger, Roland Weidl & Bernhard Zobel, INNOVENT e.V. Technology Development Jena

The PYROSIL® technique is a well known process which is used to produce SiOx (more precisely SiOx(OH)(4-2x)) layers in order to modify surfaces and their properties. This is accomplished by using Combustion-Chemical Vapour Deposition (C-CVD) a cost saving atmospheric pressure technique. As precursors both liquid and gaseous compounds can be used.

The precursors are pyrolysed by a flame which also serves as a heating source for the substrate allowing both in-line and off-line integration into an existing process.
The SiOx coatings have the potential for several different applications e.g. improved long time stability and mechanical stability of hydrophobic coatings on glass, improved adhesion of organic coatings (such as powder lacquers, adhesives), antireflection and therefore transmission improving properties and so on.

Current results and several different aspects for the application of this technology will be presented.

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The Authors